Introduction to nanolithography techniques.

Recent developments in Focused Electron/Ion Beam Induced deposition.

José María De Teresa,
Instituto de Nanociencia y Materiales de Aragón (INMA)
CSIC-Universidad de Zaragoza, 50009 Zaragoza (Spain)

In the first part of the talk, the key concepts underlying nanolithography will be described and the main nanolithography techniques will be introduced and compared in terms of the achievable resolution, throughput, pattern complexity, process complexity and cost. Selected examples of applications of nanolithography in today’s technology will be shown[1].

In the second part of the talk, I will describe recent developments in the nanolithography technique called Focused Electron/Ion Beam Induced Deposition (FEBID/FIBID). After introducing the fundamentals and the main advantages of FEBID/FIBID, I will describe in detail the use of FEBID for the growth of magnetic tips, with applications in magnetic resonance force microscopy, scanning nanowire magnetic force sensing and magnetic force microscopy[2]. Secondly, I will describe FIBID under cryogenic conditions (Cryo-FIBID), a new technique that has been applied to grow metallic W-C deposits[3], with 600-times enhancement in the growth speed when compared to standard room-temperature FIBID and with minimized ion-induced damage[4]. Experiments of Cryo-FIBID with other precursors beyond W(CO)6 will be described in the last part of the talk.

[1] Book Nanofabrication: nanolithography techniques and their applications, J. M. De Teresa (editor), chapter 1, Institute of Physics, UK, 2020.

[2] A. Fernández-Pacheco et al., Materials 13, 3774 (2020); and J. Pablo-Navarro et al., manuscript in preparation.

[3] R. Córdoba, P. Orús, S. Strohauer, T. Torres, J. M. De Teresa, Sci. Repts. 9, 14076 (2019)

[4] J. M. De Teresa, P. Orús, R. Córdoba, P. Philipp, Micromachines 10, 799 (2019)

José María de Teresa is research professor at the Instituto de Nanociencia y Materiales de Aragón (INMA, CSIC-Universidad de Zaragoza) since 2010. After a PhD at U. Zaragoza, he got postdoctoral positions at IFW-Dresden and CNRS-Paris. He coordinates the Spanish network on Nanolithography (NANOLITO)  and he chairs the Condensed Matter Division Board in the European Physical Society (CMD-EPS). His main research interests are the nanofabrication with focused electron/ion beams and its application to nanoelectronics, magnetic materials and nano-superconductors. He has recently edited for IOP (UK) the book Nanofabrication: nanolithography techniques and their applications. Please, browse his webpage for further details.